KARAKTERISASI REAKTOR PLASMA CVD UNTUK DEPOSISI DIAMOND-LIKE CARBON COATING

Putut Marwoto

Abstract


Kertas kerja ini melaporkan karakterisasi reaktor plasma CVD yang telah dirancang bangun dengan catu daya DC untuk deposisi film tipis DLC dengan gas metana (CH4) dan argon (Ar) sebagai sumber gas.Hasil eksperimen menunjukkan bahwa tegangan operasi plasma dipengaruhi oleh tekanan reaktor, laju lairan gas, jenis gas,  komposisi campuran gas CH4 dan argon, jarak elektroda dan suhu katoda.

References


Chan, C. Y., K. H. Lai, M. K. Fung, W.K. Wong, I. Belo, R. F. Huang, C.S. Lee, S.T., Lee, S.P. Wong, (2001), Deposition and properties of tetrahedral amorphous carbon films prepared on magnetic hard disks, J. Vac. Sci. Technol. A 19(4), American Vacuum Society.

Date, L., Raduone, K., Despax., B., Yousfi, M., Caquineau, H., and Hennad, A. (1999). Analysis of the N2O dissociation in RF discharge reactor. J. Phys. D: Appl. Phys. 32. p.1478 – 1488.

Grill, A. (1993). Cold Plasma in Materials Fabrications From Fundamentals to Applications. New York: IEEE Press.

Herle R., E. Reido, A. Pasquearello, and A. Baldereschi, 2001, sp2/sp3 hybridization ratio in a amorphous carbon from C 1s core-level shifts: X-ray photoelectron spectroscopy and firs-principles calculation. Physical Review B, Volume 65, p. 045101- 045101-8.

Jensen, K.F. and Kern, W. (1991). Thermal Chemical Vapor Deposition. In Vossen, J.L. and Kern,W. “Thin Film Processes II.” Boston, San Diego, New York, London, Sydney, Tokyo, Toronto: Academic Press, Inc.

Jemmer, P. (1999). Mathematical Modeling and interpretation of Reactive Plasma Chemistry. Mathematical and Computer Modelling. 30. 63 – 76.

Konuma, M. (1992). Film Deposition by Plasma Technicues. Berlin, Heidelberg, New York, London, paris, Tokyo, Hongkong, Barcelona, Baudapest: Springer-Verlag.

Lacerda, R.G., Stolojan, V., Cox, D.C., Silva, S.R.P., Marques, F.C. (2002). Structural characterization of hard a-C:H films as a function of the methane pressure. Diamond and Related Materials. 11. p.980 – 984.

Lee, C.H. (1993). Theoretical study of Diamond-like carbon and nucleation of diamond. Case Western Reserve University: Ph.D thesis

Liebermen, M. A. and Lighterberg, J. A. (1994). Principles of Plasma Discharges and Materials Processing. New York, Chichester, Brisbane, Toronto, Singapore: John Wiley and Sons, Inc.

Lu, W. (1999). Sputtering Deposition and Characterization of Ultrathin AmorphousCarbon films. University of California, Berkeley: Ph.D thesis.

Luft, W., and Tsuo, Y.S. (1993). Hydrogenated amorphous Silicon Alloy Deposition Processes. Marcell Decker, Inc: New York, Basel, Hongkong.

Manage, D.P. (1998). Structural and Optical Characterization of Hydrogenated Amorphous Carbon Thin Films. University of Toronto: Ph.D Thesis.

Nicholson, D.R.(1983). Introduction to Plasma Theory. New York: John Wiley & Sons.

Reif, R. and Kern, W. (1991). Plasma-Enhanced Chemical Vapor-Deposition. In Vossen, J.L. and Kern, W. “Thin Film Processes. Boston, San Diego, New York, London, Sydney, Tokyo, Toronto: Academic Press, Inc.

Robertson, J. and Milne, W. (1998). Band model for emission from diamond-like Carbon and diamond. Journal of Non-Crystalline Solids. 227 – 230. p.558 – 564.

Sarangi, D., Panwar, O.S., Kumar, S., and Bhattacharyya, R.(2000). Characterisation of a saddle field fast atom beam source and its application to the growth of diamond-like carbon films. Vacuum. 58. 609 – 627.

Sarangi, D., Godon, C., Granier, A., Moalic, R., Goullet, A., Turban, G., Chauvet, O. (2001). Carbon nanotubes and nanostructures grown from diamond-like carbon and polyethylene. Appl. Phys. A. 73. p.765 – 768.

van De Lagemaat, J. (1998). Electrochemistry of large bandgap chemically resistant semiconductors. Utrecht University: Doctor thesis.

Yin, D., Xu, N., Liu, Z., Han, Y. and Zheng, X. (1996). Effect of applied bias voltage on the properties of a-C:H films. Surface and Coating Technology. 78. p.31 – 36.

Watson, C.J.H. (1974). Introduction to Plasma Physics. In Keen, B.E. “Plasma Physics.” Conference Series Number20. London and and Bristol: The Institute of Physics.


Refbacks

  • There are currently no refbacks.